期刊
SURFACE & COATINGS TECHNOLOGY
卷 396, 期 -, 页码 -出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2020.125966
关键词
Surface morphology; Roughness; WSi2; Coating; AFM; EBSD
资金
- National Natural Science Foundation of China [51604049]
- National Key Research and Development Program of China [2017YFB0603800 2017YFB0603802]
The WSi2 coatings on W substrate were successfully prepared by hot dip silicon-plating (HDS) method. The surface roughness, surface and cross section morphology, and texture evolution were characterized by fielde-mission scanning electron microscope (FE-SEM), energy dispersive spectroscopy (EDS), atomic force microscope (AFM), and electron back scattering diffraction (EBSD). The FE-SEM results show that the WSi2 coatings have a good adhesion with the substrate, and no microcracks and pores are observed at the surface. AFM images show that the WSi2 coatings have a similar and homogeneous surface morphology with a granular structure and nanoscale roughness, and most of surface vertical heights are less than 600 nm. The low roughness is observed when the deposition temperature is 1470 degrees C to 1530 degrees C, the Ra and Rq are 82.1-115.6 nm and 109.1-140.3 nm, respectively. EBSD analysis indicates that the WSi2 coatings have typical {100} and {110} textures with the coating thickness of 18 to 42 mu m and average grain size of 6.78 to 10.92 mu m.
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