Kinetics of the Thermal Oxidation of Ir(100) toward IrO2 Studied by Ambient-Pressure X-ray Photoelectron Spectroscopy

Using time-lapsed ambient-pressure X-ray photoelectron spectroscopy, we investigate the thermal oxidation of single-crystalline Ir(100) films toward rutile IrO2(110) in situ. We initially observe the formation of a carbon-free surface covered with a complete monolayer of oxygen, based on the binding energies of the Ir 4f and O is core level peaks. During a rather long induction period with nearly constant oxygen coverage, the work function of the surface changes continuously as sensed by the gas phase O is signal. The sudden and rapid formation of the IrO2 rutile phase with a thickness above 3 nm, manifested by distinct binding energy changes and substantiated by quantitative XPS analysis, provides direct evidence that the oxide film is formed via an autocatalytic growth mechanism that was previously proposed for PbO and RuO2.