Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal-organic framework thin films

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(II) terephthalate metal-organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.