期刊
NATURE COMMUNICATIONS
卷 11, 期 1, 页码 -出版社
NATURE PUBLISHING GROUP
DOI: 10.1038/s41467-020-14439-1
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资金
- LG Display under LGD-Yonsei University Incubation Program
- National Research Foundation of Korea (NRF) - Korean government [NRF-2018M3D1A1058793, 2015R1A5A1037668, 2016M3A7B4910798]
- Institute for Basic Science [IBS-R026-D1]
- National Research Foundation of Korea (NRF) through the government of Korea (MSIP) [NRF-2018R1A2A1A05079060]
- National Research Foundation of Korea (NRF) - Korean government (MSIT) [2018R1A3A3000666]
- National Research Foundation of Korea [2018R1A3A3000666, 2015R1A5A1037668, 2016M3A7B4910798, IBS-R026-D1-2020-A00] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10(th) of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.
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