相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。On-site SiH4 generator using hydrogen plasma generated in slit-type narrow gap
Norihisa Takei et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2018)
A first passage based model for probabilistic fracture of polycrystalline silicon MEMS structures
Zhifeng Xu et al.
JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS (2017)
Use of high order precursors for manufacturing gate all around devices
A. Hikavyy et al.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2017)
Silicon epitaxy using tetrasilane at low temperatures in ultra-high vacuum chemical vapor deposition
Ramsey Hazbun et al.
JOURNAL OF CRYSTAL GROWTH (2016)
Plasma engineering of silicon quantum dots and their properties through energy deposition and chemistry
Bibhuti Bhusan Sahu et al.
PHYSICAL CHEMISTRY CHEMICAL PHYSICS (2016)
Balmer Hα, Hβ and Hγ Spectral Lines Intensities in High-Power RF Hydrogen Plasmas
Wang Songbai et al.
PLASMA SCIENCE & TECHNOLOGY (2014)
Optical emission spectroscopy diagnostic and thermodynamic analysis of thermal plasma enhanced nanocrystalline silicon CVD process
Tengfei Cao et al.
RSC ADVANCES (2014)
Effects of Surface Temperature on High-Rate Etching of Silicon by Narrow-Gap Microwave Hydrogen Plasma
Takahiro Yamada et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2013)
Statistical characterization of vertical poly-Si channel using charge pumping technique for 3D flash memory optimization
Baojun Tang et al.
MICROELECTRONIC ENGINEERING (2013)
Future Prospects of NAND Flash Memory Technology-The Evolution from Floating Gate to Charge Trapping to 3D Stacking
Chih-Yuan Lu
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY (2012)
A benchmarking of silane, disilane and dichlorosilane for the low temperature growth of group IV layers
J. M. Hartmann et al.
THIN SOLID FILMS (2012)
Low temperature Si homo-epitaxy by reduced pressure chemical vapor deposition using dichlorosilane, silane and trisilane
B. Vincent et al.
JOURNAL OF CRYSTAL GROWTH (2010)
Low-temperature growth of epitaxial (100) silicon based on silane and disilane in a 300 mm UHV/CVD cold-wall reactor
T. N. Adarn et al.
JOURNAL OF CRYSTAL GROWTH (2010)
High-rate deposition of microcrystalline silicon in a large-area PECVD reactor and integration in tandem solar cells
Gaetano Parascandolo et al.
PROGRESS IN PHOTOVOLTAICS (2010)
Thin-Film Transistors
Robert A. Street
ADVANCED MATERIALS (2009)
Time-dependent gas phase kinetics in a hydrogen diluted silane plasma
S. Nunomura et al.
APPLIED PHYSICS LETTERS (2009)
Low-temperature RPCVD of Si, SiGe alloy, and Si1-yCy films on Si substrates using trisilane (Silcore®)
A. Gouye et al.
JOURNAL OF CRYSTAL GROWTH (2009)
Direct fabrication of large-grain polycrystalline silicon thin films by RF-biased RF-PECVD at low temperature
RD Gu et al.
THIN SOLID FILMS (2006)
Ab initio surface reaction energetics of SiH4 and Si2H6 on Si(001)-2x2 -: art. no. 174703
RD Smardon et al.
JOURNAL OF CHEMICAL PHYSICS (2005)
Topographic evolution during deposition of plasma-deposited hydrogenated silicon on glass
GT Dalakos et al.
PHYSICAL REVIEW B (2005)
Large open-circuit voltage improvement by rapid thermal annealing of evaporated solid-phase-crystallized thin-film silicon solar cells on glass
ML Terry et al.
APPLIED PHYSICS LETTERS (2005)
Influence of the total gas flow on the deposition of microcrystalline silicon solar cells
T Roschek et al.
THIN SOLID FILMS (2004)
Low temperature silicon dioxide film deposition by remote plasma enhanced chemical vapor deposition: growth mechanism
YB Park et al.
SURFACE & COATINGS TECHNOLOGY (2004)
Novel aspects in thin film silicon solar cells-amorphous, microcrystalline and nanocrystalline silicon
M Kondo et al.
THIN SOLID FILMS (2004)
Thin-film polysilicon solar cells on foreign substrates using direct thermal CVD: material and solar cell design
G Beaucarne et al.
THIN SOLID FILMS (2002)
Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure
GR Nowling et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2002)
Low-temperature epitaxial growth of Si by electron cyclotron resonance chemical vapor deposition
J Platen et al.
THIN SOLID FILMS (2001)
High aspect-ratio combined poly and single-crystal silicon (HARPSS) MEMS technology
F Ayazi et al.
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS (2000)
Infrared study of adsorption and thermal decomposition of Si2H6 on Si(100)
M Shinohara et al.
THIN SOLID FILMS (2000)
分享论文
