4.8 Article

Tailoring the Hybrid Anomalous Hall Response in Engineered Magnetic Topological Insulator Heterostructures

期刊

NANO LETTERS
卷 20, 期 3, 页码 1731-1737

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.9b04932

关键词

magnetic topological insulators; anomalous Hall effect; heterostructure engineering molecular beam epitaxy; Berry curvature

资金

  1. National Key R&D Program of China [2017YFB0405704]
  2. National Natural Science Foundation of China [11904230, 61874172]
  3. Major Project of Shanghai Municipal Science and Technology [2018SHZDZX02]
  4. Shanghai Sailing Program [19YF1433200, 17YF1429200]
  5. Engineering and Physical Sciences Research Council [EP/N032128/1]
  6. 1000-Young Talent Program of China
  7. EPSRC [EP/N032128/1] Funding Source: UKRI

向作者/读者索取更多资源

Engineering the anomalous Hall effect (AHE) is the key to manipulate the magnetic orders in the emerging magnetic topological insulators (MTIs). In this letter, we synthesize the epitaxial Bi2Te3/MnTe magnetic heterostructures and observe pronounced AHE signals from both layers combined together. The evolution of the resulting hybrid AHE intensity with the top Bi2Te3 layer thickness manifests the presence of an intrinsic ferromagnetic phase induced by the topological surface states at the heterolayer interface. More importantly, by doping the Bi2Te3 layer with Sb, we are able to manipulate the sign of the Berry phase-associated AHE component. Our results demonstrate the unparalleled advantages of MTI heterostructures over magnetically doped TI counterparts in which the tunability of the AHE response can be greatly enhanced. This in turn unveils a new avenue for MTI heterostructure-based multifunctional applications.

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