期刊
NANO LETTERS
卷 20, 期 1, 页码 559-566出版社
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.9b04292
关键词
Phosphorene; aberration-corrected TEM imaging; crystalline edge structure; graphene protection
类别
资金
- National Research Foundation of Korea [NRF-2017R1ASA1014862, NRF-2018R1A2B6008104, NRF-2019R1C1C1003643]
- Institute for Basic Science [IBS-R026-D1]
- Yonsei University Future-leading Research Initiative of 2019 [2019-22-0027]
- POSCO Science Fellowship of POSCO TJ Park Foundation
- National Research Foundation of Korea [IBS-R026-D1-2020-A00] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Phosphorene, a monolayer of black phosphorus (BP), is an elemental two-dimensional material with interesting physical properties, such as high charge carrier mobility and exotic anisotropic in-plane properties. To fundamentally understand these various physical properties, it is critically important to conduct an atomic-scale structural investigation of phosphorene, particularly regarding various defects and preferred edge configurations. However, it has been challenging to investigate mono- and few-layer phosphorene because of technical difficulties arising in the preparation of a high-quality sample and damages induced during the characterization process. Here, we successfully fabricate high-quality monolayer phosphorene using a controlled thinning process with transmission electron microscopy and subsequently perform atomic-resolution imaging. Graphene protection suppresses the e-beam-induced damage to multilayer BP and one-side graphene protection facilitates the layer-by-layer thinning of the samples, rendering high-quality monolayer and bilayer regions. We also observe the formation of atomic-scale crystalline edges predominantly aligned along the zigzag and (101) terminations, which is originated from edge kinetics under e-beam-induced sputtering process. Our study demonstrates a new method to image and precisely manipulate the thickness and edge configurations of air-sensitive two-dimensional materials.
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