Effects of annealing conditions on the properties of SnO films deposited by e-beam evaporation process

The SnO thin films have been deposited on quartz glass substrates using an e-beam evaporation system at room temperature and different post-deposition thermal treatments have been carried out. In case of annealing in air, n-type polycrystalline SnO films are obtained after annealing at 300 degrees C and 400 degrees C, respectively. For the 500 degrees C annealed film, SnO2 phase is generated due to the strong oxidation. However, when annealed in vacuum, pure p-type polycrystalline SnO films are produced. The feasible and controllable methods of p- and n-type SnO films contributes to the development of high performance devices. (C) 2019 Elsevier B.V. All rights reserved.