Chemical state, structure and mechanical properties of multi-element (CrTaNbMoV)Nx films by reactive magnetron sputtering

Multi-element CrTaNbMoV nitride films are prepared using direct current magnetron sputtering CrTaNbMoV mosaic alloy target at various N-2/(Ar + N-2) flow ratios (R-N). The influence of R-N on the composition, structure, mechanical properties and wear behavior of the films deposited at R-N= 0%, 10%, 20%, 30% and 40% are investigated. The alloy CrTaNbMoV film exhibits a simple BCC structure, while a nanocrystalline BCC structure of metals and metal nitrides is observed in the nitride films deposited at R-N = 10%. With further increasing R N from 20% to 40%, the structure evolves from BCC to FCC. The nitride film deposited at R-N= 20% exhibits the highest hardness and adhesive critical load (Lc), which are 21.6 GPa and 331 mN, respectively. The wear rate of film deposited at R-N = 20% Is decreased six times than the alloy film (R-N = 0%), indicated an excellent wear resistance.