期刊
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷 20, 期 1, 页码 516-519出版社
AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2020.17259
关键词
Gallium-Oxide; Nanomembrane; Top-Gate; MESFET
类别
资金
- Competency Development Program for Industry Specialists of the Korean Ministry of Trade, Industry and Energy (MOTIE) [N0001883]
We fabricate top-gate beta-Ga2O3 nanomembrane metal-semiconductor field-effect transistor (MESFET) using a mechanical exfoliation method, and investigate its electrical performance. The Schottky contact between top-gate metal and beta-Ga2O3 (100) channel is evaluated by characterizing properties of Schottky barrier diode, exhibiting an on/off ratio of similar to 10(6), an ideality factor of 2.8 and a turn-on voltage of 1.1 V. The proposed top-gate beta-Ga2O3 nanomembrane MESFET exhibits maximum transconductance of similar to 0.23 mS/mm, field-effect mobility of 1.2 cm(2)/V . s at V-DS = 1 V and subthreshold slope (SS) of 180 mV/dec with high on/off ratio of >10(7). These results suggest that beta-Ga2O3 nanomembrane MESFET could be a promising component toward beta-Ga2O3-based high power device applications.
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