4.2 Article

Electrical Properties of Top-Gate β-Ga2O3 Nanomembrane Metal-Semiconductor Field-Effect Transistor

期刊

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷 20, 期 1, 页码 516-519

出版社

AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2020.17259

关键词

Gallium-Oxide; Nanomembrane; Top-Gate; MESFET

资金

  1. Competency Development Program for Industry Specialists of the Korean Ministry of Trade, Industry and Energy (MOTIE) [N0001883]

向作者/读者索取更多资源

We fabricate top-gate beta-Ga2O3 nanomembrane metal-semiconductor field-effect transistor (MESFET) using a mechanical exfoliation method, and investigate its electrical performance. The Schottky contact between top-gate metal and beta-Ga2O3 (100) channel is evaluated by characterizing properties of Schottky barrier diode, exhibiting an on/off ratio of similar to 10(6), an ideality factor of 2.8 and a turn-on voltage of 1.1 V. The proposed top-gate beta-Ga2O3 nanomembrane MESFET exhibits maximum transconductance of similar to 0.23 mS/mm, field-effect mobility of 1.2 cm(2)/V . s at V-DS = 1 V and subthreshold slope (SS) of 180 mV/dec with high on/off ratio of >10(7). These results suggest that beta-Ga2O3 nanomembrane MESFET could be a promising component toward beta-Ga2O3-based high power device applications.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.2
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据