4.7 Article

Epitaxial KNbO3:Yb3+,Er3+ nanopattern for enhanced upconversion photoluminescence

期刊

JOURNAL OF ALLOYS AND COMPOUNDS
卷 813, 期 -, 页码 -

出版社

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2019.152238

关键词

Upconversion; Sol-gel; Epitaxy; Nanopattern; Nanoimprint

资金

  1. National Research Foundation of Korea [NRF-2013M3C1A3065042]
  2. Basic Science Research Program through the National Research Foundation of Korea - Ministry of Science, ICT, and Future Planning [NRF-2019R1H1A1080134]
  3. National Research Foundation of Korea [2013M3C1A3065042] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

Nanopatterned epitaxial films of upconversion (UC) materials are desirable for various applications such as display lighting, waveguides, and optical imaging. In this study, we demonstrate that a nanopatterned epitaxial film of a UC material can be fabricated by combining a sol-gel process and nanoimprint lithography. An epitaxial KNbO3:Yb3+,Er3+ film is grown on a lattice-matched SrTiO3 single-crystal substrate, which exhibits an approximately 70 times enhanced UC photoluminescence (PL) intensity compared to that of a non-epitaxial KNbO3:Yb3+,Er3+ film grown on a Si substrate. Moreover, the introduction of a nanopattern enhances the UCPL intensity similar to 20 times compared to that of a planar film with the same volume of material. Our study paves the way for a better fundamental understanding and expansion in the application of UC materials. (C) 2019 Elsevier B.V. All rights reserved.

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