期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 59, 期 2, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.35848/1347-4065/ab6faf
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资金
- Innovative Science and Technology Initiative for Security, ATLA, Japan
- Japan Society for the Promotion of Science (JSPS) [17K05047]
- Grants-in-Aid for Scientific Research [17K05047] Funding Source: KAKEN
We investigated the effect of mask materials on the epitaxial lateral overgrowth (ELO) characteristics of alpha-Ga2O3 and developed an ELO technique that can markedly suppress abnormal growth and cracking to enable long-term growth on a wide mask, which is necessary to effectively improve the crystal quality. A conventional SiOx mask provided excellent growth selectivity with only a thin amorphous GaOx layer on the mask between alpha-Ga2O3 islands. However, the amorphous layer transformed into beta-Ga2O3, which disrupted the long-term growth of alpha-Ga2O3. Amorphous deposition was avoided by using a TiOx mask. When a TiOx mask was used, kappa-Ga2O3 deposited on the mask, and no transformation to beta-Ga2O3 was observed. alpha-Ga2O3 islands with a diameter as large as approximately 25 mu m were grown by the developed ELO technique using a TiOx mask. Transmission electron microscopy observation did not detect dislocations in the outermost part of the islands. (C) 2020 The Japan Society of Applied Physics
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