4.6 Article

Inflection Phenomenon in Cryogenic MOSFET Behavior

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 67, 期 3, 页码 1357-1360

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2020.2965475

关键词

Band tail; cryo-CMOS; cryogenic; disorder; inflection; interface traps; MOSFET

资金

  1. European Union's Horizon 2020 Research and Innovation Programme through MOS-Quito (MOS-based Quantum Information Technology) [688539]

向作者/读者索取更多资源

This brief reports the analytical modeling and measurements of the inflection in the MOSFET transfer characteristics at cryogenic temperatures. Inflection is the inward bending of the drain current versus gate voltage, which reduces the current in weak and moderate inversion at a given gate voltage compared to the drift-diffusion current. This phenomenon is explained by introducing a Gaussian distribution of localized states centered around the band edge. The localized states are attributed to disorder and interface traps. The proposed model allows to extract the density of localized states at the interface from the dc current measurements.

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