期刊
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
卷 586, 期 -, 页码 -出版社
ELSEVIER
DOI: 10.1016/j.colsurfa.2019.124190
关键词
H2O2-free; Photo-Fenton; Graphitic carbon nitride (g-C3N4); Kinetics
资金
- National Natural Science Foundation of China [51674194, 51074122]
- Beijing National Laboratory for Molecular Sciences [BNLMS201825]
- CAS Key Lab of Colloids, Interfaces and Thermal Dynamics
A H2O2-free photo-Fenton reaction was proposed for degradation of organic pollutants on thermally exfoliated gC(3)N(4) using Rhodamine B (RhB) as a model organic compounds without external addition of H2O2. Compared with conventional photocatalytic degradation of RhB in absence of ferric ions, the photo-Fenton process exhibited accelerated speed and the remove efficiency reached (similar to)100% within 2 h. More importantly, the kinetics of photo-Fenton reaction is different from that of photocatalytic process. The photo-Fenton degradation conforms to pseudo-first-order kinetics while the photocatalytic reaction conforms to pseudo-zero-order kinetics according to RhB concentration. Based on the results of photoluminescence (PL), electrochemical impedance spectra (EIS) and scavenger experiments, detailed mechanism steps were established to give a satisfied explanation for the observed accelerated speed and different kinetics of photo-Fenton degradation of RhB compared with photocatalytic process.
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