4.8 Article

Oxidized impurity in transition metal nitride for improving the hydrogen evolution efficiency of transition metal nitride-based catalyst

期刊

APPLIED MATERIALS TODAY
卷 18, 期 -, 页码 -

出版社

ELSEVIER
DOI: 10.1016/j.apmt.2019.100476

关键词

Transition metal nitride; Reductive defects; Photocatalytic; Oxidized impurity; Hydrogen evolution

资金

  1. National Key Research and Development Plan [2016YFB0101205]
  2. Key Program of the Chinese Academy of Sciences [KFZD-SW-320]
  3. Ningbo program [3315]
  4. National Science Foundation of China [21371084, 21373005, 31570154]
  5. Ontario Ministry of Research and Innovation Early Researcher Award [ER15-11-123]
  6. Natural Sciences and Engineering Research Council of Canada [4361002013RGPIN]

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Transition metal nitrides (TMNs)-based catalyst as promising alternative for precious metal -based catalyst in hydrogen evolution have gained ever increasing research attention. However, the metastable nature of TMNs often results in the inevitable formation of metallic, oxidized and hydroxide impurities during fabrication. The effects of the inevitable impurities over TMNs in hydrogen evolution reaction are still unclear. Herein, choosing Ni3N as a typical example, the effect of oxidized impurity in transition metal nitride for hydrogen evolution has been systematically investigated. The metal oxdie-metal nitride heterojunction which has been in-situ created by calcinations process exhibits obviously improved performance in boosting hydrogen evolution efficiency of semiconductors as compared to metal nitride by forming Z-scheme pathway. Besides, X-ray photoelectron spectroscopy (XPS) and electron paramagnetic resonance (EPR) measurements demonstrate the formation of reductive defects on the surface of semiconductors created by ammonia treatment which also boost the hydrogen evolution efficiency. Therefore, the optimal ternary sample exhibits the highest hydrogen evolution rate (151.5 mu mol g(-1) h(-1)) under solar light irradiation, which is about 54 times higher than that of pure sample. (C) 2019 Elsevier Ltd. All rights reserved.

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