4.7 Article

The rise of 2D dielectrics/ferroelectrics

期刊

APL MATERIALS
卷 7, 期 12, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.5129447

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  1. World Premier International Research Center Initiative (WPI Initiative on Materials Nanoarchitronics), MEXT
  2. KAKENHI, JSPS
  3. Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development Satellite, MEXT
  4. Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University

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Ultrathin films with high-k dielectric/ferroelectric properties form the basis of modern electronics. With further miniaturization of electronic devices, conventional materials are expected to experience a challenge because of their critical thickness, where the dielectric/ferroelectric responses are unstable or even disappeared if the film thickness is reduced to the nanometer scale or below a two-dimensional (2D) limit. Owing to the benefit of preparing stable atomically thin film, 2D materials present tantalizing prospects for scaling high-k dielectric/ferroelectric technologies down to the actual atomic scale. Here, we review recent progress in 2D dielectrics/ferroelectrics and related device applications.

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