4.6 Article

Nitrogen-Doped Cu2O Thin Films for Photovoltaic Applications

期刊

MATERIALS
卷 12, 期 18, 页码 -

出版社

MDPI
DOI: 10.3390/ma12183038

关键词

cuprous oxide; doping; nitrogen; thin film; magnetron sputtering

资金

  1. Research Council of Norway (RCN) [251789]
  2. Romanian Executive Agency for Higher Education, Research, Development and Innovation Funding (UEFISCDI) through the M-Era.net program
  3. Norwegian Microand Nano-Fabrication Facility, NorFab [245963/F50]

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Cuprous oxide (Cu2O) is a p-type semiconductor with high optical absorption and a direct bandgap of about 2.1 eV, making it an attractive material for photovoltaic applications. For a high-performance photovoltaic device, the formation of low-resistivity contacts on Cu2O thin films is a prerequisite, which can be achieved by, for instance, nitrogen doping of Cu2O in order to increase the carrier concentration. In this work, nitrogen-doped p-type Cu2O thin films were prepared on quartz substrates by magnetron sputter deposition. By adding N-2 gas during the deposition process, a nitrogen concentration of up to 2.3 x 10(21) atoms/cm(3) in the Cu2O thin films was achieved, as determined from secondary ion mass spectroscopy measurements. The effect of nitrogen doping on the structural, optical, and electrical properties of the Cu2O thin films was investigated. X-ray diffraction measurements suggest a preservation of the Cu2O phase for the nitrogen doped thin films, whereas spectrophotometric measurements show that the optical properties were not significantly altered by incorporation of nitrogen into the Cu2O matrix. A significant conductivity enhancement was achieved for the nitrogen-doped Cu2O thin films, based on Hall effect measurements, i.e., the hole concentration was increased from 4 x 10(15) to 3 x 10(19) cm(-3) and the resistivity was reduced from 190 to 1.9 Omega.cm by adding nitrogen to the Cu2O thin films.

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