Automated characterisation and analysis of large arrays of nanostructures fabricated at wafer scale

Large-area and dense arrays of nanometric scale structures are commonly fabricated for several applications. The characterisation of sub-micron structures (below 1 mu m) at a large scale as well as the related data analysis are challenging tasks. Here, we present a method to address the image acquisition, the data extraction and the data analysis, applied to the evaluation of the uniformity of nanometric structures in a silicon master. Automated routines for both high and low magnification Scanning Electron Microscope (SEM) imaging have been successfully developed. SEM images have been automatically acquired by scripting routines, which collect large amounts of images of the nanometric structures covering multiple regions of the wafer in a few hours. Geometric parameters of the nanometric structures such as diameter, period and height have been extracted from the raw images using the developed image processing scripts. Finally, the data extracted from more than 4800 images acquired with three different characterisation scripts (1600 images for each study) have been analysed and plotted according to their position in the wafer.