Rapid Bending Origami in Micro/Nanoscale toward a Versatile 3D Metasurface

Devices consisting of 3D components are always desired for their far more controllable degrees of freedom compared with their planar counterparts; however, the limitations on the fabrication of 3D nanostructures have severely restricted their applications. Here, a focused ion beam (FIB) defined rapid bending origami method is reported to fabricate 3D micro/nanoscale architectures, by relying on ion irradiation induced 2D structure bending mechanism based on the residual stress formation in metal/dielectric film. Regulated by ions irradiation dose and energy, a large-scale programmable 2D patterns can be controllably bended to configure versatile 3D micro/nanostructures with scalable bending capacity and feature sizes down to 175 nm. The benefit of this method is, a 3D bended metasurface is designed and fabricated as an asymmetric mirror, showing a very simple strategy to realize high-efficiency unidirectional reflectionless effect. This FIB-defined bending origami proves to be a rapid fabrication approach of varied 3D configuration in micro/nanoscale with extremely flexible controllability of spatial orientation, providing more opportunities and options for various functional devices based on 3D configurations, especially for 3D metasurfaces.