相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。The Etching of Silicon Nitride in Phosphoric Acid with Novel Single Wafer Processor
Verna ChangChien et al.
2019 30TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC) (2019)
Growth Mechanism of Self-Assembled TixWyO Nanotubes Fabricated by TiW Alloy Anodization
Yung-Huang Chang et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2018)
Magnetic property enhancement of cobalt-free M-type strontium hexagonal ferrites by CaCO3 and SiO2 addition
Ching-Chien Huang et al.
INTERMETALLICS (2017)
Reactive hot pressing and mechanical properties of B4C/Li2O-Al2O3-SiO2 composites
Long Xia et al.
JOURNAL OF NON-CRYSTALLINE SOLIDS (2016)
Selective wet etching of Si3N4/SiO2 in phosphoric acid with the addition of fluoride and silicic compounds
Dongwan Seo et al.
MICROELECTRONIC ENGINEERING (2014)
Novel selective etching method for silicon nitride films on silicon substrates by means of subcritical water
K Morita et al.
INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH (2000)