4.8 Article

Dual Nanopatterns Consisting of Both Nanodots and Nanoholes on a Single Substrate

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 11, 期 47, 页码 44636-44641

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.9b16553

关键词

dual nanopatterns; nanoholes; nanodots; block copolymer self-assembly; photocleavable linker

资金

  1. National Creative Research Initiative Program
  2. National Research Foundation [2013R1A3A2042196]

向作者/读者索取更多资源

Block copolymers (BCPs) with various nanostructures such as spheres, cylinders, gyroid, and lamellae, have received great attention for their application in nanolithography through nanopattern transfer to substrates. However, the fabrication of diverse geometries, shapes and sizes of nanostructure on a single substrate at the desired position could not be achieved because the nanostructure based on BCPs is mainly determined by the volume fraction of one block. Here, we synthesize polystyrene-hv-poly(methyl methacrylate) copolymer (PS-hv-PMMA), which contains a photocleavable linker at the junction point between PS and PMMA blocks. After vertically oriented PMMA cylindrical nanodomains in a thin film on a substrate were obtained, dual nanopatterns composed of high-density array of nanodots and nanoholes were successfully fabricated at the desired area on a single substrate using selective irradiation with a mask. The dual nanopatterns could be used to prepare metal (or metal oxide) nanostructure arrays consisting of both nanodots and nanoholes, which are utilized for smart sensors capable of simultaneously detecting two independent molecules on nanodots and nanoholes.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据