4.8 Article

Dual-Gated MoS2 Neuristor for Neuromorphic Computing

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 11, 期 44, 页码 41482-41489

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.9b10072

关键词

neuromorphic computing; 2D material; neuristor; ionic gating; synaptic plasticity; dual-gate

资金

  1. National Natural Science Foundation of China [61834001, 61574007, 61904003, 61421005]
  2. Program of Introducing Talents of Discipline to Universities (111 Project) [B18001]
  3. China Postdoctoral Science Foundation [8206300173]

向作者/读者索取更多资源

The field of neuromorphic computing systems has been through enormous progress in recent years, whereas some issues are still remaining to be solved. One of the biggest challenges in neuromorphic circuit designing is the lack of a robust device with functions comparable to or even better than the metal-oxide-semiconductor field-effect transistor (MOSFET) used in traditional integrated circuits. In this work, we demonstrated a MoS2 neuristor using a dual-gate transistor structure. An ionic top gate is designed to control the migration of ions, while an electronic back gate is used to control electronic migration. By applying different driving signals, the MoS2 neuristor can be programmed as a neuron, a synapse, or an n-type MOSFET, which can be seen as a fundamental building block in the neuromorphic circuit design. The MoS2 neuristor provides viable solutions for future reconfigurable neuromorphic systems and can be a promising candidate for future neuromorphic computing.

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