4.6 Review

A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

期刊

MICROMACHINES
卷 10, 期 8, 页码 -

出版社

MDPI
DOI: 10.3390/mi10080552

关键词

silicon oxynitride; thin film; photoluminescence; chemical vapor deposition; physical vapor deposition

资金

  1. Beijing Municipal Science and Technology Commission [Z181100004418004]
  2. National Natural Science Foundation of China [61501039]
  3. Beijing Natural Science Foundation [2162017]
  4. Research and Development Program of Beijing Institute of Graphic Communication [Ec201808, Ea201803]
  5. Programme of Key Technologies of Thin Film Printing Electronics [04190118002/042]
  6. Programme of Flexible Printed Electronic Materials and Technology Innovation [04190118002/092]

向作者/读者索取更多资源

Silicon oxynitride (SiNxOy) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiNxOy film. In particular, the preparation of SiNxOy film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.

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