4.8 Article

Waterproof molecular monolayers stabilize 2D materials

出版社

NATL ACAD SCIENCES
DOI: 10.1073/pnas.1909500116

关键词

molecular monolayer stabilizer; multilayer 2D materials; anticorrosion

资金

  1. Center for Excitonics, an Energy Frontier Research Center - US Department of Energy, Office of Science, Basic Energy Sciences [DE-SC0001088]
  2. NSF [ECCS-1610806, 1453218]
  3. Australian Research Council Discovery Project [DP190100295]
  4. Australian National University (ANU) Futures Scheme [Q4601024]
  5. Ministry of Science and Technology of China [2013CB933401]
  6. National Science Foundation of China [11474279]
  7. Strategic Priority Research Program of the Chinese Academy of Sciences [XDB07010100]
  8. Royal Society
  9. US Army Research Office through the Massachusetts Institute of Technology Institute for Soldier Nanotechnologies [023674]
  10. Inter-University Cooperative Research Program of the Institute for Materials Research, Tohoku University [15G0031]
  11. Div Of Electrical, Commun & Cyber Sys
  12. Directorate For Engineering [1453218] Funding Source: National Science Foundation

向作者/读者索取更多资源

Two-dimensional van der Waals materials have rich and unique functional properties, but many are susceptible to corrosion under ambient conditions. Here we show that linear alkylamines n-CmH2m+1NH2, with m = 4 through 11, are highly effective in protecting the optoelectronic properties of these materials, such as black phosphorus (BP) and transition-metal dichalcogenides (TMDs: WS2, 1T'-MoTe2, WTe2, WSe2, TaS2, and NbSe2). As a representative example, n-hexylamine (m = 6) can be applied in the form of thin molecular monolayers on BP flakes with less than 2-nm thickness and can prolong BP's lifetime from a few hours to several weeks and even months in ambient environments. Characterizations combined with our theoretical analysis show that the thin monolayers selectively sift out water molecules, forming a drying layer to achieve the passivation of the protected 2D materials. The monolayer coating is also stable in air, H-2 annealing, and organic solvents, but can be removed by certain organic acids.

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