期刊
PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA
卷 116, 期 42, 页码 20844-20849出版社
NATL ACAD SCIENCES
DOI: 10.1073/pnas.1909500116
关键词
molecular monolayer stabilizer; multilayer 2D materials; anticorrosion
资金
- Center for Excitonics, an Energy Frontier Research Center - US Department of Energy, Office of Science, Basic Energy Sciences [DE-SC0001088]
- NSF [ECCS-1610806, 1453218]
- Australian Research Council Discovery Project [DP190100295]
- Australian National University (ANU) Futures Scheme [Q4601024]
- Ministry of Science and Technology of China [2013CB933401]
- National Science Foundation of China [11474279]
- Strategic Priority Research Program of the Chinese Academy of Sciences [XDB07010100]
- Royal Society
- US Army Research Office through the Massachusetts Institute of Technology Institute for Soldier Nanotechnologies [023674]
- Inter-University Cooperative Research Program of the Institute for Materials Research, Tohoku University [15G0031]
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [1453218] Funding Source: National Science Foundation
Two-dimensional van der Waals materials have rich and unique functional properties, but many are susceptible to corrosion under ambient conditions. Here we show that linear alkylamines n-CmH2m+1NH2, with m = 4 through 11, are highly effective in protecting the optoelectronic properties of these materials, such as black phosphorus (BP) and transition-metal dichalcogenides (TMDs: WS2, 1T'-MoTe2, WTe2, WSe2, TaS2, and NbSe2). As a representative example, n-hexylamine (m = 6) can be applied in the form of thin molecular monolayers on BP flakes with less than 2-nm thickness and can prolong BP's lifetime from a few hours to several weeks and even months in ambient environments. Characterizations combined with our theoretical analysis show that the thin monolayers selectively sift out water molecules, forming a drying layer to achieve the passivation of the protected 2D materials. The monolayer coating is also stable in air, H-2 annealing, and organic solvents, but can be removed by certain organic acids.
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