期刊
PLASMA PROCESSES AND POLYMERS
卷 16, 期 12, 页码 -出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.201900127
关键词
plasma-assisted atomic layer deposition; plasma printing; titanium dioxide
资金
- Marie Curie Initial Training Network [606889]
- FOM/NWO [KIEM-HTSM 16KIEMH03]
A microplasma printer is employed to deposit thin film patterns of TiO2 by titanium tetra-isopropoxide and N-2/O-2 plasma at atmospheric pressure. The setup is adopted to carry out deposition in two configurations, namely under chemical vapor deposition (CVD) and atomic layer deposition (ALD) modes. The properties of TiO2, as well as the patterning resolution, are investigated. The amorphous TiO2 deposited in the CVD mode contains a relatively high level of impurities (residual carbon content of 5-10 at.%) and is characterized by a low refractive index of 1.8. With the ALD mode on the other hand, TiO2 is obtained with a low level of impurities (<1 at.% C and <2 at.% N), a refractive index of 1.98, and a growth per cycle of 0.15 nm. Furthermore, the spatial resolution for a 8-nm-thick film is determined by X-ray photoelectron spectroscopy line scan and found to be equal to 2,000 and 900 mu m for the CVD and ALD modes, respectively. This study can be regarded as the first step toward area-selective CVD and ALD of TiO2 by a microplasma printer, which can be further explored and extended to other material systems.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据