期刊
IEEE ELECTRON DEVICE LETTERS
卷 40, 期 9, 页码 1503-1506出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2019.2930189
关键词
Ga2O3; MOSFET; power electronics; breakdown; high voltage
资金
- Federal Ministry of Education and Research, Germany [03VP03711]
Lateral beta-Ga2O3 MOSFET for power switching applications with a 1.8 kV breakdown voltage and a record power figure of merit of 155 MW/cm(2) are demonstrated. Sub-mu m gate length combined with gate recess was used to achieve low ON-state resistances with reasonable threshold voltages above -24 V. The combination of compensation-doped high-quality crystals, implantation-based inter-device isolation, and SiNx-passivation yielded in consistently high average breakdown field strengths of 1.8-2.2 MV/cm for gate-drain spacings between 2 and 10 mu m. These values outperform the results of more established wide-bandgap device technologies, such as SiC or GaN, and the major Ga2O3 material promise-a higher breakdown strength-is well demonstrated.
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