4.8 Article

Polarity control of carrier injection for nanowire feedback field-effect transistors

期刊

NANO RESEARCH
卷 12, 期 10, 页码 2509-2514

出版社

TSINGHUA UNIV PRESS
DOI: 10.1007/s12274-019-2477-6

关键词

silicon nanowire; reconfigurable transistor; positive-feedback loop; separate gate

资金

  1. MOTIE (Ministry of Trade, Industry Energy) [10067791]
  2. KSRC (Korea Semiconductor Research Consortium)
  3. Mid-career Researcher Program [NRF-2016R1E1A1A02920171]
  4. Brain Korea 21 Plus Project in 2019 through the National Research Foundation of Korea (NRF) - Ministry of Science, ICT & Future Planning
  5. Korea University Grant
  6. Korea Evaluation Institute of Industrial Technology (KEIT) [10067791] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  7. National Research Foundation of Korea [21A20131612106] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

We present polarity control of the carrier injection for a feedback field-effect transistor (FBFET) with a selectively thinned p(+)-i-n(+) Si nanowire (SiNW) channel and two separate gates. The SiNW FBFET can be reconfigured in the p- or n-channel operation modes via simple control of electric signals. The two separate gates induce potential barriers in the SiNW channel for selective control of the carrier injection. In contrast to previously reported reconfigurable transistors, our transistor features symmetry of the electrical characteristics for the p- and n-channel operation modes. Positive-feedback operation of the SiNW FBFET provides superior switching characteristics for the p- and n-type configurations, including the on/off ratios (similar to 10(5)) and subthreshold swings (1.36-1.78 mV/dec). This novel transistor is a promising candidate for reconfigurable electronics.

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