4.7 Article

A simple one-step approach to fabrication of highly hydrophobic silk fabrics

期刊

APPLIED SURFACE SCIENCE
卷 360, 期 -, 页码 207-212

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2015.10.186

关键词

Atomic layer deposition; Silk fabrics; TiO2; Hydrophobicity

资金

  1. National Natural Science Funds for Distinguished Young Scholar of China [51325306]
  2. National Natural Science Foundation of China [51203124]
  3. Program for Middle-aged and Young Talents from Educational Commission of Hubei Province [Q20120103]

向作者/读者索取更多资源

Highly hydrophobic silk fabric surfaces were successfully fabricated using a simple one-step atomic layer deposition (ALD) process. The surface morphology, chemical composition, and structure of bare silk fabric and silk fabrics coated with titanium dioxide (TiO2) subjected to 800 and 1600 ALD cycles were measured using scanning electron microscopy (SEM), field-emission scanning electron microscopy (FESEM), energy-dispersive spectroscopy (EDS), X-ray diffraction (XRD), and scanning probe microscopy (SPM). The surface wettability of the silk fabrics was evaluated by determining their static water contact angles (WCAs) and roll-off angles. The results suggest that the good hydrophilicity of the surfaces of bare silk fabrics can be changed to high hydrophobicity by the application of TiO2 nanoparticles to their surfaces using ALD. The high hydrophobicity achieved can be attributed to the increase in roughness of the silk fabric surface. The laundering durability of TiO2-coated silk fabrics is greatly improved by increasing the thickness of the ALD TiO2 films. Crown Copyright (C) 2015 Published by Elsevier B.V. All rights reserved.

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