期刊
APPLIED SURFACE SCIENCE
卷 373, 期 -, 页码 51-60出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2015.12.054
关键词
Metal deposition; Nanotechnology; Electrochemistry; Thiols; Lithography; Self-assembled monolayers
类别
资金
- Engineering and Physical Sciences Research Council [EP/I004602/1, EP/L017008/1, EP/K039210/1, EP/K031252/1, EP/E061303/1] Funding Source: researchfish
- EPSRC [EP/K031252/1, EP/E061303/1, EP/I004602/1, EP/L017008/1, EP/K039210/1] Funding Source: UKRI
The electrochemical deposition of Au onto Au substrates modified by self-assembled monolayers (SAMs) was studied by linear sweep voltammetry (LSV), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Patterned SAMs exhibiting electrochemical contrast were prepared by two different methods. One used microcontact printing (mu CP) to generate a binary SAM of omega-(4'-methyl-biphenyl-4-y1)-propane thiol (CH3-C6H4-C6H4-(CH2)(3)-SH, MBP3) and octadecane thiol (CH3(CH2)(17)SH, ODT). Templated by the SAM, a gold microelectrode structure was electrodeposited featuring a line 15 mu m wide and 3 mm long. After transfer to an epoxy substrate the structure proved to be electrically conductive across the full length. The other patterning method applied electron beam lithography (EBL) where electrochemical contrast was achieved by crosslinking molecules in a single component SAM of MBP3. An electron dose above 250 mC/cm(2) results in a high deposition contrast. The choice of parameters for the deposition/lift-off process is found to be more critical for Au compared to Cu studied previously. The origin of the differences and implications for nanoscale patterning are discussed. (C) 2015 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据