期刊
APPLIED PHYSICS LETTERS
卷 108, 期 26, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4955024
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资金
- Industrial Strategic Technology Development Program [10045145]
- Ministry of Trade, Industry and Energy (MOTIE, Korea)
- Korea Evaluation Institute of Industrial Technology (KEIT) [10045145] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
- National Research Foundation of Korea [22A20130000091] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Enhancement-mode multilayer molybdenum disulfide (MoS2) field-effect transistors (FETs), which are an immensely important component toward low-power electronics based on a two-dimensional layered semiconductor, are demonstrated using the fluoropolymer CYTOP as a gate dielectric. The fabricated devices exhibit threshold voltage (V-TH) of similar to 5.7V with field-effect mobility (mu(FE)) of up to 82.3 cm(2)/V s, and the characteristics are compared with the depletion-mode characteristics of MoS2 FETs with the cross-linked Poly(4-vinylphenol) gate dielectric (V-TH similar to -7.8 V). UV photoelectron spectroscopy analysis indicates that increased surface potential due to the surface dipole effect of the fluorine group influences the positive V-TH shift. Published by AIP Publishing.
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