4.6 Article

Van der Waals epitaxy of ultrathin α-MoO3 sheets on mica substrate with single-unit-cell thickness

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APPLIED PHYSICS LETTERS
卷 108, 期 5, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.4941402

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资金

  1. National Natural Science Foundation of China (NSFC) [51302268, 11474157, 11034005, 11574141, 61475070]
  2. Ministry of Science and Technology of China (MOST) [2010CB630705, 2012CB921502]
  3. Ministry of Education of the People's Republic of China (MOE) (SRFDP) [20120091120033]

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We report on van der Waals epitaxy of single-crystalline alpha-MoO3 sheets with single-unit-cell thickness on the mica substrate. The crystalline lattice structure, growth habits, and Raman spectra of the grown alpha-MoO3 sheets are analyzed. The anisotropic growth of alpha-MoO3 sheets can be understood by period bond chains theory. Unlike monolayer MoS2 or graphene, Raman spectra of alpha-MoO3 do not possess frequency shift from bulk crystal to single-unit-cell layer. The relative intensities of two Raman modes (A(g)) at 159 and 818cm(-1) are sensitive to the polarization of incident light. This scenario provides a quick approach to determine the lattice orientation of alpha-MoO3 crystals. Our studies indicate that van der Waals epitaxial growth is a simple and effective way to fabricate high-quality ultrathin alpha-MoO3 sheets for physical property investigations and potential applications. (C) 2016 AIP Publishing LLC.

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