期刊
APPLIED PHYSICS EXPRESS
卷 9, 期 4, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.7567/APEX.9.041101
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资金
- MacDiarmid Institute for Advanced Materials and Nanotechnology
- Royal Society of New Zealand Rutherford Discovery Fellowship
- Grants-in-Aid for Scientific Research [16K06309, 15J07829, 15H05421] Funding Source: KAKEN
Silver oxide Schottky contacts (SCs), reactively sputtered using a low-power Ar: O-2 rf-plasma on SnO2 films grown by mist-CVD, showed significantly improved figures-of-merit compared with plain-metal SCs, with barrier heights of 0.91 eV and ideality factors close to unity. These SCs were used to fabricate thin-film metal-semiconductor FETs with on/off ratios > 10(6) on the same solution-processed material. It is proposed that the high quality of these SCs is due to the oxidized fabrication methodology, whereby reactive oxygen species are likely to be present during the formation of the Schottky interface, leading to the removal of the native surface electron accumulation layer. (C) 2016 The Japan Society of Applied Physics
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