期刊
APPLIED OPTICS
卷 58, 期 19, 页码 5159-5164出版社
OPTICAL SOC AMER
DOI: 10.1364/AO.58.005159
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资金
- Sichuan Provincial Department of Education [16ZA0047]
- Sichuan Science and Technology Program [2018JY0439]
- Science and Technology Innovation Young Talent Project of Sichuan Province [19MZGC0028]
- Opening Foundation of State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences (CAS)
- 973 Program of China [2013CBA01700]
Catenary optics has attracted much interest due to its unique properties in wave-front manipulation, field enhancement, and dispersion engineering. In this paper, the applications of catenary optics in the near-field lithography are studied. The catenary shaped nanostructures and tip-insulator-metal (TIM) structures are simultaneously utilized to increase the contrast ratio of the focal plane and to give rise to a sharp focusing focal spot with high intensity. Moreover, the full width at half-maximum of the focal spot maintains well below the diffraction limit. The proposed catenary TIM structure may improve the quality of near-field lithography and find applications in super-resolution near-field direct writing nano-lithography. (C) 2019 Optical Society of America
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