4.7 Article

Benchmarking Gate Fidelities in a Si/SiGe Two-Qubit Device

期刊

PHYSICAL REVIEW X
卷 9, 期 2, 页码 -

出版社

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevX.9.021011

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资金

  1. Army Research Office (ARO) [W911NF-17-1-0274, W911NF-12-1-0607]
  2. DOE [DE- FG02-03ER46028]
  3. NSF through the University of Wisconsin-Madison MRSEC [DMR-1121288]
  4. NWO VIDI Grant
  5. ERC
  6. NWO Zwaartekracht QSC

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We report the first complete characterization of single-qubit and two-qubit gate fidelities in silicon-based spin qubits, including cross talk and error correlations between the two qubits. To do so, we use a combination of standard randomized benchmarking and a recently introduced method called character randomized benchmarking, which allows for more reliable estimates of the two-qubit fidelity in this system, here giving a 92% fidelity estimate for the controlled-Z gate. Interestingly, with character randomized benchmarking, the two-qubit gate fidelity can be obtained by studying the additional decay induced by interleaving the two-qubit gate in a reference sequence of single-qubit gates only. This work sets the stage for further improvements in all the relevant gate fidelities in silicon spin qubits beyond the error threshold for fault-tolerant quantum computation.

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