期刊
OPTICAL MATERIALS
卷 90, 期 -, 页码 172-179出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.optmat.2019.02.034
关键词
355 nm; Laser damage; AR coatings; Substrate cleaning
资金
- NSAF
- National Natural Science Foundation of China [U1630140]
- Chinese Academy of Engineering Physics [U1630140]
- Youth Innovation Promotion Association, Chinese Academy of Sciences (CAS) [2017289]
- Innovation Foundation of the Chinese Academy of Sciences [1708381X1]
Antireflection (AR) coatings are deposited on UV grade fused silica substrates, which are cleaned in the dual ion beam sputtering device. Compared to ultrasonic and acid etching cleaning progress, ion beam etching improves the laser-induced damage threshold (LIDT) of substrates and AR coatings significantly at 355 nm. Ion beam etching declines the low LIDT defects drastically and removes lots of the impurity elements (Ce, Fe, K, and Na). Roughness test shows that the AR coatings and substrates with ion beam etching are very flat and of low roughness. Ion beam etching reduces the density of deep defect from substrates greatly. Damage morphologies show double layers delamination, which is explained via calculation of layer stress. This study will be helpful for preparation of high LIDT optical coatings.
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