期刊
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
卷 93, 期 -, 页码 357-359出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.mssp.2019.01.016
关键词
Field effect mobility; Boron; MOSFET; NIOTs; 4H-SiC; 6H-SiC
类别
资金
- HiVolt-Tech project - Spanish Government [TEC2014-54357-C2-1-R]
- AGAUR funds of the Generalitat de Catalunya [2017-SGR 1384]
In previous works, an alternative gate oxide configuration, based on a boron treatment, was proposed in order to enhance the SiO2/SiC interface quality, enabling high channel mobility n-channel 4H-SiC lateral MOSFETs. In this paper we study the effect of this treatment on 6H-SiC MOSFETs and we compare it to their 4H-SiC counterparts. The gate oxide boron treatment highly increases mobility values in 4H-SiC whereas the increase is lower in 6H-SiC. The mobility increase by the boron treatment in 4H-SiC MOSFETs is related to the decrease of near interface oxide traps (NIOTs). Then, a different NIOTs density and energy location can be seen as a possible explanation for the different mobility improvement behavior seen in both polytypes.
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