期刊
JOURNAL OF SURFACE INVESTIGATION
卷 13, 期 2, 页码 182-187出版社
PLEIADES PUBLISHING INC
DOI: 10.1134/S1027451019020149
关键词
Kaufman-type source; plasma neutralizer; ion etching; ion polishing; ion source
资金
- Russian Foundation for Basic Research [15-02-07660, 17-02-00640]
- Center for Collective Use Physics and Technology of Micro- and Nanostructures at the Institute of Physics of Microstructures, Russian Academy of Sciences
The results of testing a new miniature accelerated ion source (KLAN-10M) with a plasma neutralizer are reported. In particular, the operating modes of the source are studied, and the dependences of the ion-beam diameter and the ion current distribution along the output aperture surface on distance are measured. The ion current density with an output-aperture diameter of 7 mm (flat ion optics) is 10.4 mA/cm(2), which allows one to precisely correct local errors in the surface shape of the optical components at a low beam divergence (approximate to 15%). The operation of the plasma neutralizer is studied, the resulting electronic current of which provides, for this design, incomplete compensation of the space charge in a beam (the neutralizer current is 10 times less than the current of ions).
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