期刊
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
卷 30, 期 11, 页码 10879-10885出版社
SPRINGER
DOI: 10.1007/s10854-019-01431-9
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类别
资金
- Science and Technology Program of the Guangdong Province of China [2016A010104020]
Stannous sulfide (SnS) was grown on SiO2/Si substrates via chemical vapor deposition technique and characterized using optical microscopy, scanning electronic microscopy, X-ray diffraction, Raman spectroscopy, transmission electron microscopy, atomic force microscopy and photoluminescence (PL) spectrum, respectively. The results indicate that SnS with two distinct morphologies of the ultra-thin SnS flakes and the micron-thick SnS crystals can be grown on different zones of the SiO2/Si substrate. The ultra-thin SnS flakes are single crystal with thickness of 139nm and maximum lateral sizes of 371m. However, the micron-thick SnS crystals are 2.2m-thick and a lateral size of 15m with square shape. The difference in morphology between the ultra-thin SnS flakes and the micron-thick SnS crystals is mainly due to the difference in the initial nucleation way. Both theultra-thin SnS flakes and the micron-thick SnS crystals are orthorhombic structure with high-purity. PL strong peak of the ultra-thin SnS flakes is at 950nm, and it is at 945nm for the micron-thick SnS crystals. Their optical band gap isapproximately 1.31eV.
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