4.7 Article

Simulation and optimization of layer thickness of amorphous oxide SIZO/Ag/SIZO multilayer to enhance transmittance of transparent electrodes without sacrificing sheet resistance

期刊

JOURNAL OF ALLOYS AND COMPOUNDS
卷 798, 期 -, 页码 622-627

出版社

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2019.05.254

关键词

Transparent electrode; Oxide/metal/oxide; SiInZnO; Simulation; Optical admittance

资金

  1. Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Education [NRF-2017R1D1A3B06033837]
  2. Korea Institute of Energy Technology Evaluation and Planning (KETEP)
  3. Ministry of Trade, Industry & Energy (MOTIE) of the Republic of Korea [20172010104940]

向作者/读者索取更多资源

The transmittance enhancement of amorphous oxide-metal-amorphous oxide multilayer electrode has been performed by controlling oxide layer thickness. Layer thickness of SilnZnO/Ag/SilnZnO (SIZO OMO) has been simulated and optimized to enhance the transmittance without any sacrificing the sheet resistance. The refractive index and extinction coefficient of SIZO maintained about 2.1 and 0. As increasing top/bottom amorphous oxide SIZO layer thickness in SIZO OMO structure, maximum transmittance wavelength shifted steadily to longer wavelength region. In order to get the optimized condition of SIZO OMO, we simulated layer thickness by using Essential Macleod Program (EMP). The sheet resistance was maintained to be about 6-8 Omega/sq despite of increasing top/bottom SIZO layer. By optimizing top/bottom SIZO layer thickness, 50 nm amorphous oxide thick SIZO OMO showed transmittance of 96.67% at 550 nm, sheet resistance of 6.41 Omega/sq and figure of merit of 11.11 x 10(-2) Omega(-1). (C) 2019 Elsevier B.V. All rights reserved.

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