期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 58, 期 6, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.7567/1347-4065/ab219f
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资金
- Murata Science Foundation [1810105F]
We characterized 3.0 nm gamma-Ga2O3, 3.0 nm gamma-Al2O3, and 1.0/3.0 nm gamma-Ga2O3/Al2O3 films grown on (100) MgAl2O4 substrates. X-ray diffraction measurements revealed that gamma-Ga2O3 and gamma-Al2O3 films were coherent to the substrate with Poisson's ratios of 0.31 and 0.28. While, X-ray photoelectron spectroscopy found that band gaps of the gamma-Ga2O3 and gamma-Al2O3 films were 5.6 and 7.4 eV, respectively, and that the gamma-Ga2O3/Al2O3 heterojunction had type-I band alignment with conduction-and valence-band-offsets of 1.6 and 0.2 eV, respectively. These findings regarding the end members of gamma-(AlxGa1-x)(2)O-3 will be beneficial for further study on gamma-(AlxGa1-x)(2)O-3-based heterostructures. (C) 2019 The Japan Society of Applied Physics
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