期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 58, 期 -, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.7567/1347-4065/ab0cfd
关键词
-
资金
- UK Engineering and Physical Sciences Research Council [EP/M011682/1]
- EPSRC Impact Acceleration Account Follow on Fund of the University of Cambridge
- EPSRC [EP/M011682/1, EP/M010589/1] Funding Source: UKRI
Utilising our novel wafer-scale electrochemical porosification approach which proceeds through the top surface by means of nanoscale vertical etching pathways, we have prepared full 2 inch wafers containing alternating solid GaN and nanoporous GaN (NP-GaN) layers that form distributed Bragg reflectors (DBRs), and have regrown InGaN-based light emitting diode (LED) heterostructures on these wafers. The NP-GaN DBR wafer is epi-ready and exhibits a peak reflectance of 95% at 420 nm prior to growth of the LED heterostructure. We observe a 1.8x enhancement in peak intensity of LED electroluminescence from processed devices, and delayed onset of efficiency droop with increased injection current. (C) 2019 The Japan Society of Applied Physics
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据