期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 58, 期 9, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.7567/1347-4065/ab2195
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资金
- JSPS KAKENHI [JP15H05421]
This review summarizes progress in the fabrication of Schottky diodes (SDs), metal-semiconductor and metal-oxide-semiconductor FETs on mist-chemical vapor deposition-(CVD)-grown oxide semiconductor thin films for optical displays, high power devices, and gas sensing applications. These devices generally showed high on-currents, high rectification and on-off ratios. Mist-CVD-grown IGZO and ZTO MESFETs displayed an extreme stability against numerous standard stress conditions. Negative bias temperature stress produced a significant and permanent improvement in the performance of amorphous oxide SDs and MESFETs. Sub-kV breakdown voltage and low specific on-resistance of 0.4 m Omega cm(2) were realized in vertical Sn-doped alpha-Ga2O3 Schottky barrier diodes by Oda et al. [Appl. Phys. Express 9, 021101 (2016)] but severe current collapse was observed in planar Sn-doped alpha-Ga2O3 MESFETs. Mist CVD has demonstrated its capacity for not only atomic layer-by-layer control but also the growth of active layers in high-performance electronic devices, even though it is a solution-processed atmospheric pressure technique. (C) 2019 The Japan Society of Applied Physics
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