期刊
CARBON
卷 146, 期 -, 页码 650-659出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.carbon.2019.01.099
关键词
Phosphorus/nitrogen doping; Graphene; Thermal oxidation resistance; Kinetics; Mechanism
资金
- National Science Foundation of China [51673076, 51603190, 51273073]
The use of reduced graphene oxide (rGO) in high-temperature oxidization (HTO) environment, is limited by its poor thermal oxidation and fire resistance. In this study phosphorus and nitrogen co-doped reduced graphene oxide (PN-rGO) with high oxidation and fire resistance was prepared by hydrothermal and microwave treatment and its thermal oxidation decomposition kinetics and mechanisms were analyzed. Concisely, PN-rGO presents an increment of 162 degrees C in the decomposition temperature relative to undoped rGO (WrGO), and excellent fire resistance with only a similar to 20% mass loss after burning. Thermal oxidation degradation kinetics reveals that WrGO shows continuously increasing activation energy (E) within a range of 119.7-182.9 kJ/mol, while PN-rGO exhibits almost constant E of similar to 171.8 kJ/mol during main degradation stage. Moreover, the improved E at initial stage by phosphorus/nitrogen doping, combining with the char analysis, suggested that the introduction of strong chemical bonds replacing the reactive oxygen-containing groups was the key to preventing the oxidation of rGO. As one of the main properties, the electrical conductivity of PN-rGO is well kept after HTO treatment. This work demonstrates that a doping strategy can effectively expand the application of graphene-based devices in HTO environment. (c) 2019 Elsevier Ltd. All rights reserved.
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