A high entropy silicide by reactive spark plasma sintering

A high-entropy silicide (HES), (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si-2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 degrees C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive spectrometer analysis except a small amount of zirconium that is combined with oxygen as impurity particles. The Young's modulus, Poisson's ratio, and Vickers hardness of the obtained (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si-2 are also measured.