期刊
NANOMATERIALS
卷 9, 期 3, 页码 -出版社
MDPI
DOI: 10.3390/nano9030320
关键词
p-type TFT; p-type oxide semiconductors; SnO electrical properties; oxide structure analysis
类别
资金
- European Commission under project INVISIBLE from ERC [228144]
- BET-EU (H2020-TWINN-2015) [GA 692373]
- TREND (ERC-StG-2016) [GA 716510]
- 1D Neon (H2020-NMP-2015-IA) [685758-21D]
- FEDER funds through the COMPETE 2020 Program [UID/CTM/50025/2013]
- Portuguese Ministry of Science and Technology (FCT-MCTES) [SFRH/BPD/62942/2009]
- Fundação para a Ciência e a Tecnologia [SFRH/BPD/62942/2009] Funding Source: FCT
This work reports on the role of structure and composition on the determination of the performances of p-type SnOx TFTs with a bottom gate configuration deposited by rf magnetron sputtering at room temperature, followed by a post-annealed step up to 200 degrees C at different oxygen partial pressures (O-pp) between 0% and 20% but where the p-type conduction was only observed between in a narrow window, from 2.8% to 3.8%. The role of structure and composition were evaluated by XRD and Mossbauer spectroscopic studies that allows to identify the best phases/compositions and thicknesses (around 12 nm) to be used to produce p-type TFTs with saturation mobility of 4.6 cm(2) V-1 s(-1) and on-off ratio above 7 x 10(4), operating at the enhancement mode with a saturation voltage of -10 V. Moreover, a brief overview is also presented concerning the present state of the existing developments in processing SnOx TFTs with different methods and using different device configurations.
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