期刊
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
卷 34, 期 3, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/1361-6641/ab0150
关键词
gallium oxide; Hall effect; heavy doping; impurity band conduction; variable range hopping
类别
资金
- University of Michigan's M-Cubed 2.0 Program
- SPAWAR through DARPA Young Faculty Award [N66001-14-1-4046]
- College of Engineering
- NSF Major Research Instrumentation award [DMR-1428226]
Temperature-dependent resistivity and Hall measurements were performed on a heavily Sn-doped (010) beta-Ga2O3 substrate grown by edge-defined film-fed method. At room temperature, the Hall electron mobility was 77.7 cm(2)V(-1)s(-1). A maximum mobility of 95.2 cm(2)V(-1)s(-1) was achieved at T = 185 K. Because the doping concentration is near the Mott critical value of 2.48 x 10(18)cm(-3), Hall electron concentration and mobility data were analyzed using the two-band model, which considers transport through both the conduction band and an impurity band. At T > 200 K, charge transport is limited by free carriers in the conduction band. The donor ionization energy was extracted to be E-CD = 4 meV. At T <= 200 K, the net conductivity is due to electrons in the impurity band, with a concentration 7.6 x 10(18)cm(-3) and a low mobility of similar to 0.09-2.27 cm(2)V(-1)s (-1). Over a very wide temperature range, 1.7-200 K, transport in the impurity band was found to occur via variable range hopping, where the average hopping length increases with decreasing temperature.
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