期刊
MATERIALS LETTERS
卷 249, 期 -, 页码 70-72出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.matlet.2019.03.048
关键词
Additive manufacturing; Selective electron beam melting; Process monitoring; Backscattered electrons; Processing window; Ti-6Al-4V
资金
- German Research Foundation (DFG) [SFB814]
The availability of a reliable processing window is the basic requirement for processing new materials via selective electron beam melting (SEBM). Typically, these processing windows are derived by a time-consuming procedure comprising fabrication, metallographic preparation and analysis of standardized specimens for every parameter set. This study demonstrates the immediate development of a processing window during one single SEBM process. An electron optical image acquisition system provides the necessary information for evaluation and subsequent adaption of process parameters. It is shown that this immediate approach delivers processing windows with sufficient accuracy, while the required time is substantially reduced from weeks or even months to several hours. (C) 2019 Elsevier B.V. All rights reserved.
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