Composition control of Zn1-xMgxO thin films grown using mist chemical vapor deposition

In equilibrium reaction processes, the precise control of composition ratios in multi-component thin films is problematic due to the changes in the state of precursor materials, which are caused by differences in metal ion stabilities. We have identified a strategy to resolve this problem by first developing a theory and then constructing a fine-channel type mist chemical vapor deposition (mist-CVD) system with two solution chambers and a mist-mixing chamber. Zn1-xMgxO thin films were fabricated using the conventional and the developed mist-CVD systems to verify the theory. The properties of the Zn1-xMgxO thin films produced using the two systems were significantly different. The Mg composition ratio in the film was clearly influenced by the Mg ion stability and all the measurement results support the theory. (C) 2019 The Japan Society of Applied Physics