4.6 Article

SnSe/SiO2/Si Heterostructures for Ultrahigh-Sensitivity and Broadband Optical Position Sensitive Detectors

期刊

IEEE ELECTRON DEVICE LETTERS
卷 40, 期 1, 页码 55-58

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2018.2884325

关键词

Position sensitive detectors; van der Waals growth; heterostructure; SnSe; Si

资金

  1. National Natural Science Foundation of China [51502348]
  2. Natural Science Foundation of Shandong Province [ZR2016AM15]
  3. Open Foundation of the State Key Laboratory of Electronic Thin Films and Integrated Devices [KFJJ201606]
  4. Foundamental Research Funds for the Central Universities of China University of Petroleum [18CX02038A]

向作者/读者索取更多资源

In this letter, optical position sensitive detectors (PSDs) based on SnSe/SiO2/Si heterostructures with an atomically abrupt interface are fabricated via the van der Waals (vdWs) growth of the large-area multilayered SnSe nanosheets on SiO2-buffered Si. The as-fabricated SnSe/SiO2/Si PSD device has a broadband photoresponse from visible to near-infrared light, especially showing an extremely high sensitivity up to 687.5 mV/mm under a relatively low laser power of 1.0 mW. The unique characteristics from the SnSe/Si vdWs interface are proposed to be the key factors to contribute to the excellent performance.

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