期刊
THIN SOLID FILMS
卷 669, 期 -, 页码 294-300出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2018.11.008
关键词
Atomic layer deposition; Cobalt oxide; Zirconia; Ferromagnetism; Resistive switching; Charge polarization
类别
资金
- European Regional Development Fund project Emerging orders in quantum and nano-materials [TK134]
- Spanish Ministry of Economy and Competitiveness [TEC2017-84321-C4-2-R]
- Feder funds
- Estonian Academy of Sciences (SLTFYPROF)
- Estonian Research Agency [IUT2-24, PRG4]
Nanolaminates of ZrO2 and Co3O4 were atomic layer deposited on silicon and titanium nitride at 300 degrees C. Films were confirmed to be polycrystalline in the as-deposited state, with the cubic phase dominating in both oxides. All films exhibited resistive switching characteristics and charge polarization and ferromagnetic behavior. Also, the relative permittivities of the films were measured and the dispersion functions modelled.
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